RESEARCH

Atomic Scale Processing

 Atomic Scale Processing (원자 수준 공정)

 

Objective : Development of atomic scale semiconductor processing such as ALD and ALE

 

(1) Preparing ultra-thin oxide films with excellent ferroelectric and charge trapping performances

(2) Optimization of surface adsorption and desorption processes for atomic layer etching

(3) Application of atomic scale processing to next-generation semiconductor manufacturing